Company Description
Oct, 2001 - Foundation as Semiconductor Processing Equipment Manufacturing
Feb, 2002 - Company & School Co-Development Project [Completion]
May, 2002 - Wafer Dryer Development [Completion]: STG Type IPA Enhanced Dryer
Aug, 2002 - Single Wafer Cleaner Development [Process]
Oct, 2002 - Shrink Bath Type
Advanced Alchemy Inc.t-Station Development [Process]
Mar, 2003 - Technical Innovation & Venture Company, Certificated from Korea Government '03
Apr, 2003 - IPA Enhanced Dryer Penetration [Wafer Process]
May, 2003 - Batch Type Wet-Station Penetration [Wafer Process]
Oct, 2003 - Single Type Wet-Station Penetration [OELD Process]