NITTA HAAS INCORPORATED

Company Description

1969: Rodel Inc. founded in Newark, Delaware, USA
1983: Nitta Corporation and Rodel Inc. (currently the Dow Chemical Company) found Rodel Nitta Corporation (NITTA HAAS INCORPORATED) as a joint venture
1984: Imports and sales of slurry produced by Nalco Company (via Rodel Inc.) and the SUBA series produced by Rodel Inc. begin, TA (Template Assembly) production begins
1988: With the introduction of new technology, production of the SUBA series of polishing cloths begins
1989: Utilizing our company's technology, production of the MH series of polishing cloths begins, provision of polishing systems to the Rodel Inc. chemical mechanical polishing (CMP) division begins
1992: Utilizing our company's technology, production of the R300 series of mounting film begins
1993: Provision of polishing systems to domestic device manufacturers begins
1995: Rodel Inc. obtains ISO 9001 certification; with the introduction of new technology, construction of a slurry production factory (mainly CMP slurry) in Mie Prefecture is approved
1996: Mie factory completed, Nara factory expanded
1997: Domestic production of CMP slurry begins at Mie factory, ISO 9001 certification obtained
1998: Mie factory expanded (second stage), production of IC1000 CMP pad series begins
1999: Mie factory expanded (third stage)
2000: Rodel Particle Inc. founded
2001: ISO 14001 certification obtained
2003: 20th anniversary of founding, clearing of the planned site of the Kyoto factory completed
2004: Rodel Inc. acquired in a merger, parent company becomes the Rohm and Haas Company, company name changed to Nitta Haas Incorporated, SAP system introduced
2005: Kyoto factory completed, Mie factory expanded (fourth stage)
2006: Relocation from Nara factory to Kyoto factory, Kyoto Technical Center established
2009: Rohm and Haas Company acquired in a merger, parent company becomes the Dow Chemical Company
2013: 30th anniversary of founding
Note: SUBA, MH, and IC1000 are products trademarked by our company.

Company Information

  • Business Type:Manufacturer
  • Year Established:1998
  • Year Start Exporting:1998
  • Number Of Employees:301 - 500 People
  • Total Revenue:Above US$100 Million
  • Average Lead Time:21 Day(s)
  • Trade Capacity:Eastern Asia : 40.00% Domestic Market : 30.00%
  • Production Capacity:Factory Size : Above 100,000 square meters No. of
  • R&D Capacity:No. of R&D Staff :21 - 30 People
  • Main Products:Polishing Pad,Polishing Slurry,Sapphire Polishing Pad, Sapphire Polishing Slussy, Silicon Wafer Polishing,
  • Main Markets:Eastern Asia, Domestic Market, Western Europe, Sou
  • Location:Osaka, Japan

Product

  • Polishing Pad
  • Polishing Slurry
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  • Lower defectivity higher productivity polishing slurry alkaline with q...
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  • Higher flatness lower defectivity glass polishing pads
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  • Higher flatness and Lower defectivity polishing pad for CMP
  • Lower defectivity higher productivity electro polishing equipment with...
  • Higher flatness and Lower defectivity polishing for wholesale
  • High functional higher flatness polishing pad polish machine
  • High functional lower defectivity glass polishing machine for sale
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  • High functional polishing pad for machine parts for sale
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  • Lower defectivity gold polishing machine with quick delivery
  • High functional higher flatness non woven polishing wheel
  • High functional lower defectivity polishing brush for sale
  • High functional higher productivity electro polishing machine for sale
  • High functional polishing materials for wholesales
  • Higher flatness lower defectivity automatic polishing pad for industri...
  • Higher flatness higher productivity lens polishing machine
  • Higher flatness polishing pad da polisher for wholesale
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